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抛光垫

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产品介绍

SURFIN polishing pads are ideal for use in high precision polishing of all types of semiconductor crystal materials, including silicon wafers, and also metals and glass. SURFIN has been designed to produce a super fine polished surface which is scratch-free, damage-free, and without defects of any kind. From the many types of polishing pads available, the exact type can be selected to match each job. The polishing pad can be chosen in the form of a roll or disk cut into made-to-order sizes. The product can also be ordered with a double-sided adhesive film attached to the back of the pad, for quick and easy installation.
specification of SURFIN Polishing Cloth
 
Standard thickness(mm)
Hardness°
(SHORE-A)
Apertwre
Largest width
(mm)
Used for
Overall thickenss
Fom layer
SURFIN
XXX-5
1.30
------
70±5
------
1400
 
Si(First, second polishing).
GaAs,(First polishing) LT,LN
SURFIN
018-3
1.37±0.1
0.45±0.09
70±5
ROUGH
1480
Hard Disk(Ni-P, Al)
Si(Second polishing)
SURFIN 0000
1.35±0.1
0.43±0.09
66±5
FINE
1480
Si(Finalpolishing) , Glass
SURFIN 191
1.20±0.1
0.46±0.06
67±5
FINE
1000
GaAs(Final polishing), GaP

抛光垫信息由北京飞凯曼科技有限公司为您提供,如您想了解更多关于抛光垫报价、型号、参数等信息,欢迎来电或留言咨询。

注:该产品未在中华人民共和国食品药品监督管理部门申请医疗器械注册和备案,不可用于临床诊断或治疗等相关用途