PR1-1000A
Positive Resist PR1-1000A is a positive tone photoresist designed for 365 or 436 nm wavelength
exposure, using tools such as wafer steppers, scanning projection aligners, proximity printers and
contact printers. PR1-1000A excels in applications when superior adhesion is required. Use of
adhesion promoters, such as HMDS is not recommended with PR1-1000A.
These are the advantages of PR1-1000A over other resists:
-superior resolution capability
- fast photospeed
-superior linewidth control due to suppression of reflective notching
-substrate adhesion which is superior to that of any commercial positive resist
-ease of removal after RIE process
-shelf life exceeding 1 year at room temperature storage
The formulation and processing of PR1-1000A were designed with regard to occupational and
environmental safety. The principal solvent in PR1-1000A is 1-methoxy-2-propanol and
development of PR1-1000A is accomplished in a basic water solution.
Properties
♦ Solids content (%): 20-22
♦ Principal solvent: 1-methoxy-2-propanol
♦ Appearance: light yellow liquid
♦ Coating characteristic: very uniform, striation free
♦ Film thickness information:
Coating spin speed,
40 s spin (rpm)
Film thickness after 100°C oven
bake for 15 min (nm)
800 1900-2100
3000 950-1050
4000 817-903
5000 712-788
♦Sensitivity (mJ/cm² for 1 μm thick film):
365 nm exposure wavelength: 70
436 nm exposure wavelength: 40
♦ Guaranteed shelf life at 25°C storage (years): 1
Processing
1. Application of resist by spin coating at selected spin speed for 40 s.
2. 120°C hotplate bake for 120 s or 100°C oven bake for 15 minutes.
3. Resist exposure in a tool incorporating 365 or 436 nm wavelength.
4. Resist development in Resist Developer RD6 by spray or immersion.