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g-Secretase Inhibitor IV
三糖铁琼脂培养基(TSI)
Tetraethylbutylene-1,4-diphosphonate, 98% 25GR
4-Chloro-2-(trifluoromethyl)quinoline, 97%
Ruthenium(IV) oxide, anhydrous, 99.5+% 5GR
2-(Diethylamino)ethanethiol for synthesis
柠檬酸铁(III)铵,RG
TEFLIC ACID
2,4-Dichloropyridine, 98% 25GR
3-(二乙氨基)丙酸盐酸盐,98.0%(T)