PR1-1000A
Positive Resist PR1-1000A is a positive tone photoresist designed for 365 or 436 nm wavelength
exposure, using tools such as wafer steppers, scanning projection aligners, proximity printers and
contact printers. PR1-1000A excels in applications when superior adhesion is required. Use of
adhesion promoters, such as HMDS is not recommended with PR1-1000A.
These are the advantages of PR1-1000A over other resists:
-superior resolution capability
- fast photospeed
-superior linewidth control due to suppression of reflective notching
-substrate adhesion which is superior to that of any commercial positive resist
-ease of removal after RIE process
-shelf life exceeding 1 year at room temperature storage
The formulation and processing of PR1-1000A were designed with regard to occupational and
environmental safety. The principal solvent in PR1-1000A is 1-methoxy-2-propanol and
development of PR1-1000A is accomplished in a basic water solution.
Properties
♦ Solids content (%): 20-22
♦ Principal solvent: 1-methoxy-2-propanol
♦ Appearance: light yellow liquid
♦ Coating characteristic: very uniform, striation free
♦ Film thickness information:
Coating spin speed,
40 s spin (rpm)
Film thickness after 100°C oven
bake for 15 min (nm)
800 1900-2100
3000 950-1050
4000 817-903
5000 712-788
♦Sensitivity (mJ/cm² for 1 μm thick film):
365 nm exposure wavelength: 70
436 nm exposure wavelength: 40
♦ Guaranteed shelf life at 25°C storage (years): 1
Processing
1. Application of resist by spin coating at selected spin speed for 40 s.
2. 120°C hotplate bake for 120 s or 100°C oven bake for 15 minutes.
3. Resist exposure in a tool incorporating 365 or 436 nm wavelength.
4. Resist development in Resist Developer RD6 by spray or immersion.

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注：该产品未在中华人民共和国食品药品监督管理部门申请医疗器械注册和备案，不可用于临床诊断或治疗等相关用途