RR3
Resist Remover RR3 is an aqueous Tetramethylammonium Hydroxide stripping solution intended
to remove photoresist from the surface of a substrate.
Properties
♦ Main component: aqueous TMAH
♦ Boiling temperature (°C): 100
♦ Appearance: clear liquid with foam
♦ Specific gravity at 25°C (g/cm³): 1.00
♦ Guaranteed shelf life at 25°C storage (years): >3
Processing
1 Pour the solution into the resist stripping tank.
2 Maintain the solution at room temperature under an exhaust hood.
3 Place the resist-coated substrate in the solution for 2-5 minutes with slight agitation.
4 Rinse the substrate in deionized water until the water resistivity reaches the prescribed limit.

去胶液RR3信息由陕西思的信息资讯有限公司为您提供，如您想了解更多关于去胶液RR3报价、型号、参数等信息，欢迎来电或留言咨询。

注：该产品未在中华人民共和国食品药品监督管理部门申请医疗器械注册和备案，不可用于临床诊断或治疗等相关用途