PR1-40A
Positive Resist PR1-40A is a positive tone photoresist designed for 365 or 436 nm wavelength
exposure, using tools such as wafer steppers, scanning projection aligners, proximity printers and
contact printers. PR1-40A excels in applications when superior adhesion is required. Use of
adhesion promoters, such as HMDS is not recommended with PR1-40A.
The following are advantages of using PR1-40A over other resists:
- superior resolution capability
- fast photospeed
- superior linewidth control due to suppression of reflective notching
- substrate adhesion which is superior to that of any commercial positive resist
- ease of removal after RIE process
- shelf life exceeding 1 year at room temperature storage.
The formulation and processing of PR1-40A were designed with regard to occupational and
environmental safety. The principal solvent in PR1-40A is 1-methoxy-2-propanol and development
of PR1-40A is accomplished in a basic water solution.
Properties
♦ Solids content (%): 1-5
♦ Principal solvent: 1-methoxy-2-propanol
♦ Appearance: light yellow liquid
♦ Coating characteristic: very uniform, striation free
♦ Film thickness information:
Coating spin speed,
40 s spin (rpm)
Film thickness after 115°C hotplate
bake for 6 min (nm)
1000 70-80
3000 30-50
♦ Sensitivity (mJ/cm² for 1 μm thick film):
365 nm exposure wavelength: 70
436 nm exposure wavelength: 40
♦ Guaranteed shelf life at 25°C storage (years): 1
Processing
1 Application of resist by spin coating on top of 0.7 mm thick glass substrate at 1000 rpm for 40
s.
2 115°C hotplate bake for 360 s.
3 Resist exposure in a tool incorporating 365 or 436 nm wavelength.
4 Resist development in Resist Developer RD2 by immersion. Development time for 75 nm thick

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