正性光刻胶PR1-1500A

品牌	厂商性质	产地	货期
美国futurrex产品	暂无	暂无	现货

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产品介绍

PR1-1500A
Positive Resist PR1-1500A is a positive tone photoresist designed for 365 or 436 nm wavelength
exposure, using tools such as wafer steppers, scanning projection aligners, proximity printers and
contact printers. PR1-1500A excels in applications when superior adhesion is required. Use of
adhesion promoters, such as HMDS is not recommended with PR1-1500A.
These are the advantages of PR1-1500A over other resists:
- superior resolution capability
- fast photospeed
- superior linewidth control due to suppression of reflective notching
- substrate adhesion which is superior to that of any commercial positive resist
- ease of removal after RIE process
- shelf life exceeding 1 year at room temperature storage.
The formulation and processing of PR1-1500A were designed with regard to occupational and
environmental safety. The principal solvent in PR1-1500A is 1¬methoxy-2-propanol and
development of PR1-1500A is accomplished in a basic water solution.
Properties
♦ Solids content (%): 22-25
♦ Principal solvent: 1-methoxy-2-propanol
♦ Appearance: light yellow liquid
♦ Coating characteristic: very uniform, striation free
♦ Film thickness information:
Coating spin speed,
40 s spin (rpm)
Film thickness after 100°C oven
bake for 15 min (nm)
1000 2700-2900
1500 2250-2450
2000 1760-1960
3000 1440-1640
4000 1250-1450
♦ Sensitivity (mJ/cm² for 1 μm thick film):
365 nm exposure wavelength: 70
436 nm exposure wavelength: 40
♦ Guaranteed shelf life at 25°C storage (years): 1
Processing
1 Application of resist by spin coating at selected spin speed for 40 s.
2 100°C bake in a bake oven for 15 minutes or 120ºC hotplate bake for 60 s.
3 Resist exposure in a tool incorporating 365, 406 or 436 nm wavelengths.

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