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氮化钽,12033-62-4,99.5% metals basis
品牌 | 厂商性质 | 产地 | 货期 |
---|---|---|---|
阿拉丁 | 总代理 | 中国 | 现货 |
性能特点
钽的氮化物,以1:1结构为主antalum nitride is used to create barrier or "glue" layers between copper, or othe
货号 | 规格 | CAS号 | 价格 | 操作 |
---|---|---|---|---|
T119195-10g | 10g | 12033-62-4 | ¥311.90 | 询底价 |
T119195-50g | 50g | 12033-62-4 | ¥1,351.90 | 询底价 |
中文名:氮化钽
英文名:Tantalum nitride
中文别名:一氮化钽
英文别名:DTXSID6065183|Tantalum nitride (TaN)|Tantalum mononitride|Tantalum nitride|azanylidynetantalum|EINECS 234-788-4|Q415489|MFCD00049568|FT-0695184|tantalum(III) nitride
纯度:99.5% metals basis
货号:T119195
Cas号:12033-62-4
产品介绍:
钽的氮化物,以1:1结构为主
antalum nitride is used to create barrier or "glue" layers between copper, or other conductive metals, and dielectric insulator films such as thermal oxides. These films are deposited on top of silicon wafers during the manufacture of integrated circuits, to create thin film surface mount resistors and has other electronic applications.
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